Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics

Applied Optics

Volumn 40, Issue 1, 2001, Pages 129-135

  Liang, Chen ^a   Descour, Michael R ^a   Sasian, Jose M ^a   Lerner, Scott A ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; LITHOGRAPHY; MIRRORS; MULTILAYERS; WAVEFRONTS;

ANAMORPHIC MAGNIFICATION;

ABERRATIONS;

EID: 0009155726     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.000129     Document Type: Article

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