Enhancements in rigorous simulation of light diffraction from phase shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1156-1167

  Erdmann, Andreas ^a   Kachwala, Nishrin ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b SEMATECH   (United States)

Author keywords

Lithography modeling; Phase shift mask; Rigorous diffraction; Wave aberration

Indexed keywords

ABERRATIONS; CALIBRATION; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGING TECHNIQUES; MASKS; PHASE SHIFT;

PHASE-SHIFT MASKS (PSM);

PHOTORESISTS;

EID: 0036413372     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474496     Document Type: Article

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