Topography effects and wave aberrations in advanced PSM-technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 345-355

  Erdmann, Andreas ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Lithography modeling; Phase shift mask; Rigorous diffraction; Wave aberration

Indexed keywords

ABERRATIONS; ALGORITHMS; DIFFRACTION; ETCHING; IMAGING TECHNIQUES; LITHOGRAPHY; PHASE SHIFT;

TOPOGRAPHY EFFECTS;

MASKS;

EID: 0035760047     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435734     Document Type: Conference Paper

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