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Volumn 21, Issue 4, 2003, Pages 1822-1824

Reflection high-energy electron diffraction pattern of GaN grown on 6H-SiC by metalorganic molecular beam epitaxy using AlGaN template

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; ELECTRON DIFFRACTION; METALLORGANIC VAPOR PHASE EPITAXY; MOLECULAR BEAM EPITAXY; PARAMETER ESTIMATION; PATTERN RECOGNITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON NITRIDE; SUBSTRATES;

EID: 0141458054     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1585076     Document Type: Conference Paper
Times cited : (1)

References (15)
  • 5
    • 84948966772 scopus 로고    scopus 로고
    • edited by J. H. Edgar, S. Stride, I. Akasaki, H. Amano, and C. Wetzel (INSPEC, London)
    • J. M. Redwing and T. F. Kuech, Gallium Nitride and Related Semiconductors, edited by J. H. Edgar, S. Stride, I. Akasaki, H. Amano, and C. Wetzel (INSPEC, London, 1999), pp. 416-425.
    • (1999) Gallium Nitride and Related Semiconductors , pp. 416-425
    • Redwing, J.M.1    Kuech, T.F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.