Reliability monitoring and screening issues with ultrathin gate dielectric devices

IEEE Transactions on Device and Materials Reliability

Volumn 1, Issue 1, 2001, Pages 60-68

  Abadeer, W W ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Burn in; Dielectric breakdown; Dislocation; Ionic; Metallic; NBTI; Screen; Voltage ramp

Indexed keywords

EID: 0042860978     PISSN: 15304388     EISSN: 15304388     Source Type: Journal    
DOI: 10.1109/7298.946460     Document Type: Article

References (28)

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