Suppressed vacancy coalescence in dilute interconnect alloys exposed to electrotransport

Materials Letters

Volumn 57, Issue 24-25, 2003, Pages 3729-3734

  Zehe, A ^a  

^a BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

Author keywords

Aluminium; Atomic properties; Copper; Crystalline materials; Electromigration; Interconnects; Pure metals; Silver; Voids

Indexed keywords

COALESCENCE; CRYSTAL IMPURITIES; ELECTROMIGRATION; EROSION; MICROELECTRONICS; TRANSPORT PROPERTIES;

ELECTROTRANSPORT;

ALLOYS;

EID: 0042562096     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00170-8     Document Type: Article

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