X-ray diffraction study of the phase transition of the Si(111)(√3×√3)-Ag surface

Surface Review and Letters

Volumn 10, Issue 2-3, 2003, Pages 519-524

  Takahashi, Toshio ^a   Tajiri, Hiroo ^a   Sumitani, Kazushi ^a   Akimoto, Koichi ^b   Sugiyama, Hiroshi ^c   Zhang, Xiaowei ^c   Kawata, Hiroshi ^c  

^a UNIVERSITY OF TOKYO   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c INSTITUTE OF MATERIALS STRUCTURE SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LEAST SQUARES APPROXIMATIONS; LIGHT REFLECTION; LOW TEMPERATURE PHENOMENA; PHASE TRANSITIONS; THERMAL EFFECTS; X RAY DIFFRACTION;

DIFFUSE SCATTERING;

SURFACE STRUCTURE;

SILICON; SILVER;

ANISOTROPY; CONFERENCE PAPER; LOW TEMPERATURE PROCEDURES; PHASE TRANSITION; ROOM TEMPERATURE; SURFACE PROPERTY; TEMPERATURE DEPENDENCE; X RAY DIFFRACTION;

EID: 0041845169     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0218625x03005050     Document Type: Conference Paper

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