In-situ X-ray scattering study of continuous silica - Surfactant self-assembly during steady-state dip coating

Journal of Physical Chemistry B

Volumn 107, Issue 31, 2003, Pages 7683-7688

  Doshi, Dhaval A ^a,h   Gibaud, Alain ^b,c   Liu, Nanguo ^a   Sturmayr, Dietmar ^d   Malanoski, Anthony P ^a   Dunphy, Darren R ^b   Chen, Hongji ^a   Narayanan, Suresh ^e   MacPhee, Andrew ^e,g   Wang, Jin ^e   Reed, Scott T ^b   Hurd, Alan J ^b,h   Van Swol, Frank ^a,b   Brinker, C Jeffrey ^a,b,f  

^a University of New Mexico   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c UNIVERSITÉ DU MAINE   (France)

^d VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^e ARGONNE NATIONAL LABORATORY   (United States)

^f ADVANCED MATERIALS LABORATORY   (United States)

^g UNIVERSITY OF CALIFORNIA   (United States)

^h LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EVAPORATION; MESOPOROUS MATERIALS; MONTE CARLO METHODS; PROTECTIVE COATINGS; SILICA; SOLVENTS; SURFACE ACTIVE AGENTS; X RAY SCATTERING;

MESOPOROUS THIN FILMS;

THIN FILMS;

EID: 0041733097     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp027214i     Document Type: Article

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