-
1
-
-
0035911625
-
Feedback control of plasma etching reactors for improved etching uniformity
-
A. Armaou, J. Baker, and P. D. Christofides. Feedback control of plasma etching reactors for improved etching uniformity, Chem. Eng. Sci., 56:1467-1475, 2001.
-
(2001)
Chem. Eng. Sci.
, vol.56
, pp. 1467-1475
-
-
Armaou, A.1
Baker, J.2
Christofides, P.D.3
-
2
-
-
0033167354
-
Plasma-enhanced chemical vapor deposition: Modeling and control
-
A. Armaou and P. D. Christofides. Plasma-enhanced chemical vapor deposition: Modeling and control. Chem. Eng. Sci., 54:3305-3314, 1999.
-
(1999)
Chem. Eng. Sci.
, vol.54
, pp. 3305-3314
-
-
Armaou, A.1
Christofides, P.D.2
-
3
-
-
0032072478
-
5) thin films for advanced dielectric applications
-
5) thin films for advanced dielectric applications. Mater. Sci. Eng., R., 22:269-322, 1998.
-
(1998)
Mater. Sci. Eng., R.
, vol.22
, pp. 269-322
-
-
Chaneliere, C.1
Autran, J.L.2
Devine, R.A.B.3
Balland, B.4
-
4
-
-
0035508013
-
Spectroscopic study of plasma using zirconium tetrar tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide
-
B. O. Cho, S. Lao, L. Sha, and J. P. Chang. Spectroscopic study of plasma using zirconium tetrar tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide. J. Vac. Sci. Tech. A, 19(6):2751, 2001.
-
(2001)
J. Vac. Sci. Tech. A
, vol.19
, Issue.6
, pp. 2751
-
-
Cho, B.O.1
Lao, S.2
Sha, L.3
Chang, J.P.4
-
6
-
-
0000020022
-
Structure and stability of ultrathin zirconium oxide layers on Si(001)
-
M. Copel, M. Gribelyuk, and E.P. Gusev. Structure and stability of ultrathin zirconium oxide layers on Si(001). Appl. Phys. Lett., 76:436-438, 2000.
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 436-438
-
-
Copel, M.1
Gribelyuk, M.2
Gusev, E.P.3
-
8
-
-
0026188184
-
Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides
-
H. J. Frenck, E. Oesterschulze, R. Beckmann, W. Kulisch, and R. Kassing. Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides. Mater. Sci. Eng.A, 139:394-400, 1991.
-
(1991)
Mater. Sci. Eng. A
, vol.139
, pp. 394-400
-
-
Frenck, H.J.1
Oesterschulze, E.2
Beckmann, R.3
Kulisch, W.4
Kassing, R.5
-
9
-
-
0032272375
-
Ultra-thin gate oxides performance and reliability
-
H. Iwai and H. S. Momose. Ultra-thin gate oxides performance and reliability. IEDM Tech. Dig., pages 163-166, 1998.
-
(1998)
IEDM Tech. Dig.
, pp. 163-166
-
-
Iwai, H.1
Momose, H.S.2
-
10
-
-
0031140867
-
Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultrathin-oxide nMOSFET's
-
S. H. Lo, D. A. Buchanan, Y. Taur, and W. Wang. Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultrathin-oxide nMOSFET's. IEEE Electron. Device Lett., 18:209-211, 1997.
-
(1997)
IEEE Electron. Device Lett.
, vol.18
, pp. 209-211
-
-
Lo, S.H.1
Buchanan, D.A.2
Taur, Y.3
Wang, W.4
-
11
-
-
0030381671
-
Selection of metalorganic precursors for MOCVD of metallurgical coatings: Application to Cr-based coatings
-
F. Maury, L. Gueroudji, and C. Vahlas. Selection of metalorganic precursors for MOCVD of metallurgical coatings: Application to Cr-based coatings. Surf. Coat. Technol., 87:316-324, 1996.
-
(1996)
Surf. Coat. Technol.
, vol.87
, pp. 316-324
-
-
Maury, F.1
Gueroudji, L.2
Vahlas, C.3
-
12
-
-
0003459529
-
-
Perkin-Elmer, Physical Electronics Division
-
J. F. Moulder, K. D. Bomben, P. E. Sobol W. F. Stickle, and J. Chastain. Handbook of X-Ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data. Perkin-Elmer, Physical Electronics Division, 1992.
-
(1992)
Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data
-
-
Moulder, J.F.1
Bomben, K.D.2
Sobol, P.E.3
Stickle, W.F.4
Chastain, J.5
|