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Volumn 2, Issue , 2003, Pages 1320-1327

A Method for Real-Time Control of Thin Film Composition using OES and XPS

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CYCLOTRON RESONANCE; EMISSION SPECTROSCOPY; FEEDBACK CONTROL; LIGHT EMISSION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0041445542     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (15)
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    • (2001) Chem. Eng. Sci. , vol.56 , pp. 1467-1475
    • Armaou, A.1    Baker, J.2    Christofides, P.D.3
  • 2
    • 0033167354 scopus 로고    scopus 로고
    • Plasma-enhanced chemical vapor deposition: Modeling and control
    • A. Armaou and P. D. Christofides. Plasma-enhanced chemical vapor deposition: Modeling and control. Chem. Eng. Sci., 54:3305-3314, 1999.
    • (1999) Chem. Eng. Sci. , vol.54 , pp. 3305-3314
    • Armaou, A.1    Christofides, P.D.2
  • 4
    • 0035508013 scopus 로고    scopus 로고
    • Spectroscopic study of plasma using zirconium tetrar tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide
    • B. O. Cho, S. Lao, L. Sha, and J. P. Chang. Spectroscopic study of plasma using zirconium tetrar tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide. J. Vac. Sci. Tech. A, 19(6):2751, 2001.
    • (2001) J. Vac. Sci. Tech. A , vol.19 , Issue.6 , pp. 2751
    • Cho, B.O.1    Lao, S.2    Sha, L.3    Chang, J.P.4
  • 6
    • 0000020022 scopus 로고    scopus 로고
    • Structure and stability of ultrathin zirconium oxide layers on Si(001)
    • M. Copel, M. Gribelyuk, and E.P. Gusev. Structure and stability of ultrathin zirconium oxide layers on Si(001). Appl. Phys. Lett., 76:436-438, 2000.
    • (2000) Appl. Phys. Lett. , vol.76 , pp. 436-438
    • Copel, M.1    Gribelyuk, M.2    Gusev, E.P.3
  • 8
    • 0026188184 scopus 로고
    • Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides
    • H. J. Frenck, E. Oesterschulze, R. Beckmann, W. Kulisch, and R. Kassing. Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides. Mater. Sci. Eng.A, 139:394-400, 1991.
    • (1991) Mater. Sci. Eng. A , vol.139 , pp. 394-400
    • Frenck, H.J.1    Oesterschulze, E.2    Beckmann, R.3    Kulisch, W.4    Kassing, R.5
  • 9
    • 0032272375 scopus 로고    scopus 로고
    • Ultra-thin gate oxides performance and reliability
    • H. Iwai and H. S. Momose. Ultra-thin gate oxides performance and reliability. IEDM Tech. Dig., pages 163-166, 1998.
    • (1998) IEDM Tech. Dig. , pp. 163-166
    • Iwai, H.1    Momose, H.S.2
  • 10
    • 0031140867 scopus 로고    scopus 로고
    • Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultrathin-oxide nMOSFET's
    • S. H. Lo, D. A. Buchanan, Y. Taur, and W. Wang. Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultrathin-oxide nMOSFET's. IEEE Electron. Device Lett., 18:209-211, 1997.
    • (1997) IEEE Electron. Device Lett. , vol.18 , pp. 209-211
    • Lo, S.H.1    Buchanan, D.A.2    Taur, Y.3    Wang, W.4
  • 11
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    • Selection of metalorganic precursors for MOCVD of metallurgical coatings: Application to Cr-based coatings
    • F. Maury, L. Gueroudji, and C. Vahlas. Selection of metalorganic precursors for MOCVD of metallurgical coatings: Application to Cr-based coatings. Surf. Coat. Technol., 87:316-324, 1996.
    • (1996) Surf. Coat. Technol. , vol.87 , pp. 316-324
    • Maury, F.1    Gueroudji, L.2    Vahlas, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.