Finite element modeling of ion-beam lithography masks for pattern transfer distortions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 768-778

  Frisque, Gary A ^a   Tejeda, Richard O ^a   Lovell, Edward G ^a   Engelstad, Roxann L ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; MASKS; MATHEMATICAL MODELS;

EQUIVALENT MODELING METHODS; PATTERN TRANSFER DISTORTIONS;

ION BEAM LITHOGRAPHY;

EID: 0032672988     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351145     Document Type: Conference Paper

References (13)