New developments in MEMS using SiC and TiNi shape memory alloy materials

Current Opinion in Solid State and Materials Science

Volumn 2, Issue 5, 1997, Pages 566-570

  Zorman, Christian A ^a   Mehregany, Mehran ^a   Kahn, Harold ^a   Heuer, Arthur H ^b  

^a Microfabrication Laboratory   (United States)

^b NONE

Author keywords

APCVD atmospheric chemical vapor deposition; LPCVD low pressure chemical vapor deposition; MEMS microelectromechanical systems; SOI silicon on insulator

Indexed keywords

EID: 0038869803     PISSN: 13590286     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-0286(97)80046-0     Document Type: Article

References (53)

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