Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 230-236

  Kleineberg, U ^a   Westerwalbesloh, Th ^a   Hachmann, W ^a   Heinzmann, U ^a   Tummler J ^b   Scholze, F ^b   Ulm, G ^b   Mullender S ^c  

^a BIELEFELD UNIVERSITY   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

At wavelength; Extreme ultraviolet coatings; UHV e beam evaporation

Indexed keywords

ELECTRON BEAMS; EVAPORATION; MOLYBDENUM; SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

ULTRAVIOLET COATINGS;

MULTILAYERS;

EID: 0038615987     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00289-X     Document Type: Conference Paper

References (12)

1. Folta J.A., Bajt S., Barbee T.W., Grabner F.R., Mirkarimi P.B., Montcalm C., Nguyen T., Schmidt M.A., Spiller E., Walton C.C., Wedowski M. Proc. SPIE. 3676:1999;702-709.
2. Murakami K., Shiraishi M. Proc. SPIE. 4506:2001;56.
3. Louis E., Yakshin A.E., Görts P.C., Oestreich S., Stuik R., Maas E.L.G., Kessels M.J.H., Bijkerk F., Haidl M., Müllender S., Mertin M., Schmitz D., Scholze F., Ulm G. Proc. SPIE. 3997:2000;406-411.
4. Lim Y.C., Westerwalbesloh T., Aschentrup A., Wehmeyer O., Haindl G., Kleineberg U., Heinzmann U. Appl. Phys. A. 72:(1):2001;121-124.
5. Braun S., Mai H., Moss M., Scholz R., Lesson A. Jpn. J. Appl. Phys. 41:2002;4074.
6. Tichenor D.A., Ray-Chaudhuri A.K., Replogle W.C., Stulen R.H., Kubiak G.D., Klebanoff L.E., Wronosky J.B., Hale L.C., Chapman H.N., Taylor J.S., Naulleau P. Proc. SPIE. 4343:2001;19-37.
7. Meiling H., Benschop J.P., Kürz P. Proc. SPIE. 4343:2001;38-50.
8. Spiller E., Baker S., Parra E., Tarrio C. Proc. SPIE. 3767:1999;143-153.
9. Stock H.J., Hamelmann F., Kleineberg U., Menke D., Schmiedeskamp B., Osterried K., Heidemann K.F., Heinzmann U. Appl. Optics. 36:1997;1650-1652.
10. P.B. Mirkarimi, D.G. Stearns, S.L. Baker, P.A. Kearney, C. Montcalm, E.M. Gullikson; Presented on the 2nd International Workshop on EUV Lithography, October 18th 2000 (online abstract available from: http://www.sematech.org/public/news/conferences/euvl2000/documents/401_MLC02_mir karimi.pdf).
11. Scholze F., Beckhoff B., Brandt G., Fliegauf R., Gottwald A., Klein R., Meyer B., Rost D., Schwarz U.D., Thornagel R., Tümmler J., Veldkamp M., Weser J., Ulm G. Proc. SPIE. 4344:2001;402-413.
12. Tummler J., Scholze F., Brandt G., Meyer B., Scholz F., Vogel K., Ulm G., Poier M., Klein U., Diete W. New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region. Proc. SPIE. 4688:2002;338-347.