-
4
-
-
85039658358
-
-
Honor of Robert P. Frankenthal, The Electrochemical Society Proceedings Series, PV2002-13 (Pennington, NJ: The Electrochemical Society)
-
M.J. Graham, Proc. Symp., Corrosion Science: A Retrospective and Current Status, in Honor of Robert P. Frankenthal, The Electrochemical Society Proceedings Series, PV2002-13 (Pennington, NJ: The Electrochemical Society, 2002), p. 112.
-
(2002)
Proc. Symp., Corrosion Science: A Retrospective and Current Status
, pp. 112
-
-
Graham, M.J.1
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6
-
-
0038200663
-
-
Faraday Trans
-
J.A. Bardwell, G.I. Sproule, D.F. Mitchell, B. MacDougall, M.J. Graham. J. Chem. Soc., Faraday Trans. 87 (1991): p. 1,011.
-
(1991)
J. Chem. Soc.
, vol.87
, pp. 1011
-
-
Bardwell, J.A.1
Sproule, G.I.2
Mitchell, D.F.3
MacDougall, B.4
Graham, M.J.5
-
9
-
-
0000689236
-
-
M.F. Toney, A.J. Davenport, L.J. Oblonsky, M.P. Ryan, C.M. Vitus, Phys. Rev. Lett. 79 (1997): p. 4,282.
-
(1997)
Phys. Rev. Lett.
, vol.79
, pp. 4282
-
-
Toney, M.F.1
Davenport, A.J.2
Oblonsky, L.J.3
Ryan, M.P.4
Vitus, C.M.5
-
10
-
-
0034204812
-
-
A.J. Davenport, L.J. Oblonsky, M.P. Ryan, M.F. Toney, J. Electrochem. Soc. 174 (2000): p. 2,162.
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(2000)
J. Electrochem. Soc.
, vol.174
, pp. 2162
-
-
Davenport, A.J.1
Oblonsky, L.J.2
Ryan, M.P.3
Toney, M.F.4
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17
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0023310814
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-
R. Goetz, D.F. Mitchell, B. MacDougall, M.J. Graham, J. Electrochem. Soc. 134 (1987): p. 535.
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(1987)
J. Electrochem. Soc.
, vol.134
, pp. 535
-
-
Goetz, R.1
Mitchell, D.F.2
MacDougall, B.3
Graham, M.J.4
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18
-
-
0036693083
-
-
A. Pakes, P. Skeldon, G.E. Thompson, R.J. Hussey, S. Moisa, G.I. Sproule, D. Landheer, M.J. Graham, Surf. Interface Anal. 34 (2002): p. 481.
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(2002)
Surf. Interface Anal.
, vol.34
, pp. 481
-
-
Pakes, A.1
Skeldon, P.2
Thompson, G.E.3
Hussey, R.J.4
Moisa, S.5
Sproule, G.I.6
Landheer, D.7
Graham, M.J.8
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19
-
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0035501685
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A. Pakes, F. Echeverria, P. Skeldon, G.E. Thompson, J.W. Fraser, J.P. McCaffrey, S. Moisa, M.J. Graham, H. Habazaki, K. Shimizu, Corros. Sci. 43 (2001): p. 2,173.
-
(2001)
Corros. Sci.
, vol.43
, pp. 2173
-
-
Pakes, A.1
Echeverria, F.2
Skeldon, P.3
Thompson, G.E.4
Fraser, J.W.5
McCaffrey, J.P.6
Moisa, S.7
Graham, M.J.8
Habazaki, H.9
Shimizu, K.10
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20
-
-
0036722572
-
-
E. Zhuravlyova, L. Iglesias-Rubianes, A. Pakes, P. Skeldon, G.E. Thompson, X. Zhou, T. Quance, M.J. Graham, H. Habazaki, K. Shimizu, Corros. Sci. 44 (2002): p. 2,153.
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(2002)
Corros. Sci.
, vol.44
, pp. 2153
-
-
Zhuravlyova, E.1
Iglesias-Rubianes, L.2
Pakes, A.3
Skeldon, P.4
Thompson, G.E.5
Zhou, X.6
Quance, T.7
Graham, M.J.8
Habazaki, H.9
Shimizu, K.10
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21
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0010381117
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The Electrochemical Society Proceedings Series, PV 97-21 (Pennington, NJ: The Electrochemical Society)
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R.J. Hussey, G.I. Sproule, M.J. Graham, Proc. 27th State-of-the-Art Program on Compound Semiconductors, The Electrochemical Society Proceedings Series, PV 97-21 (Pennington, NJ: The Electrochemical Society, 1997), p. 305.
-
(1997)
Proc. 27th State-of-the-Art Program on Compound Semiconductors
, pp. 305
-
-
Hussey, R.J.1
Sproule, G.I.2
Graham, M.J.3
-
22
-
-
0032818430
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-
P. Schmuki, R.J. Hussey, G.I. Sproule, Y. Tao, Z.R. Wasilewski, J.P. McCaffrey, M.J. Graham, Corros. Sci. 41 (1999): p. 1,467.
-
(1999)
Corros. Sci.
, vol.41
, pp. 1467
-
-
Schmuki, P.1
Hussey, R.J.2
Sproule, G.I.3
Tao, Y.4
Wasilewski, Z.R.5
McCaffrey, M.J.6
Graham, J.P.7
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24
-
-
0345663029
-
-
The Electrochemical Society Proceeding Series, PV 97-1 (Pennington, NJ The Electrochemical Society)
-
C.I.H. Ashby, J.P. Sullivan, P.P. Newcomer, N.A. Missert, H.G. Hou, B.E. Hammons, A.G. Baca, Proc. 26th State-of-the-Art Program on Compound Semiconductors. The Electrochemical Society Proceeding Series, PV 97-1 (Pennington, NJ The Electrochemical Society, 1997), p. 58.
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(1997)
Proc. 26th State-of-the-Art Program on Compound Semiconductors
, pp. 58
-
-
Ashby, C.I.H.1
Sullivan, J.P.2
Newcomer, P.P.3
Missert, N.A.4
Hou, H.G.5
Hammons, B.E.6
Baca, A.G.7
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25
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0010916813
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G. Hultquist, B. Tveten, E. Hörnlund, M. Limbäck, R. Haugsrud, Oxid. Met. 56 (2001): p. 313.
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(2001)
Oxid. Met.
, vol.56
, pp. 313
-
-
Hultquist, G.1
Tveten, B.2
Hörnlund, E.3
Limbäck, M.4
Haugsrud, R.5
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26
-
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0037525253
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-
in press
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G. Hultquist, G.I. Sproule, S. Moisa, M.J. Graham, U. Södervall, J. Electrochem. Soc. (2003): in press.
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(2003)
J. Electrochem. Soc.
-
-
Hultquist, G.1
Sproule, G.I.2
Moisa, S.3
Graham, M.J.4
Södervall, U.5
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29
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0001334989
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-
R.J. Hussey, P. Papaiacovou, J. Shen, D.F. Mitchell, M.J. Graham, Mater. Sci. Eng. A120 (1989): p. 147.
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(1989)
Mater. Sci. Eng.
, vol.120 A
, pp. 147
-
-
Hussey, R.J.1
Papaiacovou, P.2
Shen, J.3
Mitchell, D.F.4
Graham, M.J.5
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30
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0025019177
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P. Papalacovou, R.J. Hussey, D.F. Mitchell, M.J. Graham, Corros. Sci. 30 (1990): p. 451.
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(1990)
Corros. Sci.
, vol.30
, pp. 451
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Papalacovou, P.1
Hussey, R.J.2
Mitchell, D.F.3
Graham, M.J.4
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31
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0026960815
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-
F.A. Kish, S.J. Caracci, N. Holonyak, Jr., K.C. Hsieh, J.E. Baker, S.A. Maranowski, A.R. Sugg, J.M. Dallesasse, R.M. Fletcher, C.P. Huo, T.D. Osentowski, M.G. Crawford, J. Electron. Mater. 21(1992): p. 1,133.
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(1992)
J. Electron. Mater.
, vol.21
, pp. 1133
-
-
Kish, F.A.1
Caracci, S.J.2
Holonyak N., Jr.3
Hsieh, K.C.4
Baker, J.E.5
Maranowski, S.A.6
Sugg, A.R.7
Dallesasse, J.M.8
Fletcher, R.M.9
Huo, C.P.10
Osentowski, T.D.11
Crawford, M.G.12
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32
-
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85039665033
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held December 7-10 (Electron Devices Society of IEEE)
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U.K. Mishra, P. Parikh, P. Chavarkar, J. Yen, J. Champlain, B. Thibeault, H. Reese, S.S. Shi, E. Hu, L. Zhu, J. Speck, Tech. Dig.-Int. Electron Devices Meet. held December 7-10 (Electron Devices Society of IEEE, 1997), p. 21.1.1.
-
(1997)
Tech. Dig.-Int. Electron Devices Meet
-
-
Mishra, U.K.1
Parikh, P.2
Chavarkar, P.3
Yen, J.4
Champlain, J.5
Thibeault, B.6
Reese, H.7
Shi, S.S.8
Hu, E.9
Zhu, L.10
Speck, J.11
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33
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0037525254
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London, U.K.: The Institute of Metals
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R. Prescott, D.F. Mitchell, M.J. Graham, Proc. 2nd Int. Conf. on Microscopy of Oxidation (London, U.K.: The Institute of Metals, 1993), p. 455.
-
(1993)
Proc. 2nd Int. Conf. on Microscopy of Oxidation
, pp. 455
-
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Prescott, R.1
Mitchell, D.F.2
Graham, M.J.3
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35
-
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0029360965
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R. Prescott, D.F. Mitchell, M.J. Graham, J. Doychak, Corros. Sci. 37 (1995): p. 1,341.
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(1995)
J. Doychak, Corros. Sci.
, vol.37
, pp. 1341
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Prescott, R.1
Mitchell, D.F.2
Graham, M.J.3
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36
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0002950373
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E. Schumann, J.C. Yang, M. Rühle, M.J. Graham, Oxid. Met. 46, 1/2 (1996): p. 37.
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(1996)
Oxid. Met.
, vol.46
, Issue.1-2
, pp. 37
-
-
Schumann, E.1
Yang, J.C.2
Rühle, M.3
Graham, M.J.4
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37
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0013030077
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-
London, U.K.: The Institute of Metals
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B.A. Pint, A.J. Garatt-Reed, L.W. Hobbs, Proc. 2nd Int. Conf. on Microscopy of Oxidation (London, U.K.: The Institute of Metals, 1993), p. 463.
-
(1993)
Proc. 2nd Int. Conf. on Microscopy of Oxidation
, pp. 463
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Pint, B.A.1
Garatt-Reed, A.J.2
Hobbs, L.W.3
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38
-
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0032092513
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C. Mennicke, E. Schumann, M. Rühle, R.J. Hussey, G.I. Sproule, M.J. Graham, Oxid. Metals 49 (1998): p. 455.
-
(1998)
Oxid. Metals
, vol.49
, pp. 455
-
-
Mennicke, C.1
Schumann, E.2
Rühle, M.3
Hussey, R.J.4
Sproule, G.I.5
Graham, M.J.6
-
39
-
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0004607079
-
-
J.M. Dallesasse, N. Holonyak, Jr., A.R. Sugg, T.A. Richard, N. El-Zein, Appl. Phys. Lett. 57 (1990): p. 2,844.
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 2844
-
-
Dallesasse, J.M.1
Holonyak N., Jr.2
Sugg, A.R.3
Richard, T.A.4
El-Zein, N.5
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40
-
-
0036804165
-
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R.J. Hussey, R. Driad, G.I. Sproule, S. Moisa, J.W. Fraser, Z.R. Wasilewski, J.P. McCaffrey, D. Landheer, M.J. Graham, J. Electrochem. Soc. 149 (2002): p. G581.
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(2002)
J. Electrochem. Soc.
, vol.149
-
-
Hussey, R.J.1
Driad, R.2
Sproule, G.I.3
Moisa, S.4
Fraser, J.W.5
Wasilewski, Z.R.6
McCaffrey, J.P.7
Landheer, D.8
Graham, M.J.9
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41
-
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0037525252
-
-
held September 17-22 (Hokkaido, Japan: Science Reviews)
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R.J. Hussey, G.I. Sproule, J.P. McCaffrey, R. Driad, Z.R. Wasilewski, P.J. Poole, D. Landheer, M.J. Graham, Proc. Int. Symp. on High-Temperature Corrosion and Protection 2000, held September 17-22 (Hokkaido, Japan: Science Reviews, 2000), p. 39.
-
(2000)
Proc. Int. Symp. on High-Temperature Corrosion and Protection 2000
, pp. 39
-
-
Hussey, R.J.1
Sproule, G.I.2
McCaffrey, J.P.3
Driad, R.4
Wasilewski, Z.R.5
Poole, P.J.6
Landheer, D.7
Graham, M.J.8
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42
-
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85039672524
-
-
The Electrochemical Society Proceedings Series (Pennington, NJ: The Electrochemical Society)
-
R.J. Hussey, G.I. Sproule, J.P. McCaffrey, R. Driad, P.J. Poole, D. Landheer, M.J. Graham, A.J. SpringThorpe, A. Pakes, E. Echeverria, P. Skeldon, G.E. Thompson, Proc. Int. Symp. on Oxide Films, PV 2000-4. The Electrochemical Society Proceedings Series (Pennington, NJ: The Electrochemical Society, 2000), p. 317.
-
(2000)
Proc. Int. Symp. on Oxide Films, PV 2000-4
, pp. 317
-
-
Hussey, R.J.1
Sproule, G.I.2
McCaffrey, J.P.3
Driad, R.4
Poole, P.J.5
Landheer, D.6
Graham, M.J.7
SpringThorpe, A.J.8
Pakes, A.9
Echeverria, E.10
Skeldon, P.11
Thompson, G.E.12
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44
-
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84903355800
-
Properties of InAlP native oxides supporting MOS inversion layer behavior
-
Abstract, Notre Dame, Indiana, June 27-29
-
P.J. Barrios, D.C. Hall, U. Chowdhury, R.D. Dupuis, J.B. Jasinski, Z. Liliental-Weber, T.H. Kosel, G.L. Snider, Abstract, "Properties of InAlP Native Oxides Supporting MOS Inversion Layer Behavior," 43rd Electronic Materials Conference, Notre Dame, Indiana, June 27-29 (2001).
-
(2001)
43rd Electronic Materials Conference
-
-
Barrios, P.J.1
Hall, D.C.2
Chowdhury, U.3
Dupuis, R.D.4
Jasinski, J.B.5
Liliental-Weber, Z.6
Kosel, T.H.7
Snider, G.L.8
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45
-
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85039660545
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-
(London: U.K.: The Institute of Metals), in press
-
M.J. Graham, S. Moisa, G.I. Sproule, X. Wu, J.W. Fraser, P.J. Barrios, D. Landheer, A.J. SpringThorpe, M. Extavour, Proc. 5th Int. Conf. on Microscopy of Oxidation (London: U.K.: The Institute of Metals), in press.
-
Proc. 5th Int. Conf. on Microscopy of Oxidation
-
-
Graham, M.J.1
Moisa, S.2
Sproule, G.I.3
Wu, X.4
Fraser, J.W.5
Barrios, P.J.6
Landheer, D.7
SpringThorpe, A.J.8
Extavour, M.9
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