pH-controlled TMAH etchants for silicon micromachining

Sensors and Actuators, A: Physical

Volumn 53, Issue 1-3, 1996, Pages 335-339

  Tabata, Osamu ^a,b  

^a Rd Management Section   (Japan)

^b RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

Aluminum; Anisotropic etching; pH; Silicon; TMAH

Indexed keywords

EID: 0038263492     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(96)80157-9     Document Type: Article

References (5)

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