Cubic boron nitride films deposited by unbalanced RF magnetron sputtering and pulsed DC substrate bias

Thin Solid Films

Volumn 429, Issue 1-2, 2003, Pages 22-27

  Ding, X Z ^a   Zeng, X T ^a   Xie, H ^a  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Boron nitride films; FTIR; Unbalanced RF magnetron sputtering

Indexed keywords

COMPOSITION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SUBSTRATES; THRESHOLD VOLTAGE;

BIAS VOLTAGE;

CUBIC BORON NITRIDE;

EID: 0038297580     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00142-1     Document Type: Article

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