Microstructure of highly oriented, hexagonal, boron nitride thin films grown on crystalline silicon by radio frequency plasma-assisted chemical vapor deposition

Journal of Applied Physics

Volumn 80, Issue 11, 1996, Pages 6553-6555

  Andujar J L ^a   Bertran, E ^a   Maniette, Y ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041477798     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363677     Document Type: Article

References (18)

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