Influence of grid and target radius and ion-neutral collisions on grid-enhanced plasma source ion implantation process

Journal of Physics D: Applied Physics

Volumn 36, Issue 10, 2003, Pages 1192-1197

  Wang, J L ^a   Zhang, G L ^a   Fan, S H ^a   Yang, W B ^a   Yang, S Z ^a,b,c  

^a INSTITUTE OF PHYSICS   (China)

^b XIAMEN UNIVERSITY   (China)

^c SKLMMLIEB ^*  (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFUSION; ELECTRODES; PLASMA COLLISION PROCESSES; PLASMA DENSITY; PLASMA SHEATHS; PLASMA SOURCES; POISSON EQUATION; SURFACE TREATMENT;

BOLTZMANN ASSUMPTION; GRID ENHANCED PLASMA SOURCE ION IMPLANTATION PROCESSES; ION-NEUTRAL COLLISIONS;

ION IMPLANTATION;

EID: 0038282801     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/10/307     Document Type: Article

References (21)

1. Conrad J R, Radtke J L, Dodd R A, Worzala F J and Tran N C 1987 J. Appl. Phys. 62 4591-6
2. Chu P K, Qin S, Chan C, Cheung N W and Larson L A 1996 Mater. Sci. Eng. 17 207-80
3. Sheridan T E 1993 J. Appl. Phys. 74 4903-6
4. Sun M, Yang S Z and Li B 1996 J. Vac. Sci. Technol. A 14 367-9
5. Zeng X C, Liu A G, Kwok T K, Chu P K and Tang B Y 1997 Phys. Plasma 4 4431-4
6. Liu B, Zhang G L, Cheng D J, Liu C Z, He R and Yang S Z 2001 J. Vac. Sci. Technol. A 19 2958-62
7. Sun M. Yang S Z and Li B 1996 Nucl. Instrum. Meth. B 111 187-9
8. Sun M, Yang S Z and Yao W Q 198 J. Vac. Sci. Technol. A 16 2718-21
9. Liu B, Liu C Z, Chang D J, Zhang G L, He R and Yang S Z 2001 Nucl. Instrum. Methods Phys. Res. B. 184 644-8
10. Sheridan T E 1996 J. Appl. Phys. 80 66-9
11. Zeng X C, Tang B Y and Chu P K 1996 Appl. Phys. Lett. 69 3815-17
12. Zeng X C, Kwok T K, Liu A G, Chu P K, Tang B Y and Sheridan T E 1998 IEEE Trans. Plasma Sci. 26 175-80
13. Zeng X C, Kwok T K, Liu A G, Chu P K and Tang B Y 1998 J. Appl. Phys. 83 44-9
14. Wang J L, Zhang G L, Fan S H, Yang W B and Yang S Z 2002 Chin. Phys. Lett. 19 1473-5
15. Stewart R A and Lieberman M A 1991 J. Appl. Phys. 70 3481-7
16. Phelps A V 1991 J. Phys. Chem. Ref. Data 20 557-67
17. Sheridan T E and Goeckner M J 1995 J. Appl. Phys. 77 4967-72
18. Sheridan T E 1996 Surf. Coat. Technol. 85 204-8
19. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) pp 137-8
20. Smirnov B M 1981 Physics of Weakly Ionized Gases (Mir, Moscow) p 217
21. Fan Z N, Chen Q C, Chu P K and Chan C 1998 IEEE Trans. Plasma Sci. 26 1661-8