A new method for inner surface modification by plasma source ion implantation (PSII)

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 184, Issue 4, 2001, Pages 644-648

  Liu, Bin ^a   Liu, Chizi ^a   Cheng, Dajung ^a   Zhang, Guling ^a   He, Rui ^a   Yang, Si Ze ^a,b  

^a INSTITUTE OF PHYSICS   (China)

^b XIAMEN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ION IMPLANTATION; PLASMA DENSITY; PLASMA SOURCES; SPUTTERING;

FILM DEPOSITION; PLASMA SOURCE ION IMPLANTATION (PSII);

SURFACE TREATMENT;

EID: 0035577852     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00823-0     Document Type: Article

References (7)