Fluorine - An enabler in advanced photolithography

Journal of Fluorine Chemistry

Volumn 122, Issue 1, 2003, Pages 3-10

  Rothschild, M ^a   Bloomstein, T M ^a   Fedynyshyn, T H ^a   Liberman, V ^a   Mowers, W ^a   Sinta, R ^a   Switkes, M ^a   Grenville, A ^b   Orvek, K ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Calcium fluoride; Fluorine laser; Fluorocarbon polymers; Immersion lithography; Pellicles; Perfluoropolyethers; Photolithography; Photoresists

Indexed keywords

CALCIUM FLUORIDE; FLUORINE DERIVATIVE; POLYMER; SILICON DIOXIDE;

ARTICLE; CRYSTAL; ELECTRONICS INDUSTRY; IMMERSION; LASER; MOLECULE; OPTICAL INSTRUMENTATION; PHOTOCHEMISTRY; PHYSICAL CHEMISTRY; SEMICONDUCTOR; SPECTRAL SENSITIVITY; SYNTHESIS;

EID: 0037971846     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(03)00074-5     Document Type: Article

References (18)

1. Bloomstein T.M.Horn M.W.Rothschild M.Kunz R.R.Palmacci S.T.Goodman R.B. J. Vac. Sci. Technol. B 15 1997 2112.
2. Cefalas A.C.Skordoulis C.Kompitsas M.Nicolaides C.A. Opt. Commun. 55 1985 423.
3. Ishchencko V.N.Kochubei S.A.Razhev A.M. Sov. Tech. Phys. Lett. 12 1986 66.
4. Vogler K.Klaft I.Voss F.Bragin I.Bergmann E.Nagy T.Niemoeller N.Paetzel R.Govorkov S.Hua G. Proc. SPIE 4346 2001 1175.
5. Liberman V.Rothschild M.Efremow N.N.Palmacci S.T.Sedlacek J.H.C.Van Peski C.Orvek K. Proc. SPIE 4346 2001 45.
6. Burnett J.H.Levine Z.H.Shirley E.L. Phys. Rev. B 64 2001 241102.
7. Sparrow, R.W. Smith, C.M. in: Proceedings of the Third International Symposium on 157 nm Lithography, Antwerp, Belgium, 3-6 September 2002.
8. Liberman, V. Rothschild, M. Palmacci, S.T. Efremow, N.N. Sedlacek, J.H.C. Proc. SPIE 4691 (2002) 568.
9. Bloomstein T.M.Liberman V.Palmacci S.T.Rothschild M. Proc. SPIE 4346 2001 685.
10. Rothschild M.Bloomstein T.M.Curtin J.E.Downs D.K.Fedynyshyn T.H.Hardy D.E.Kunz R.R.Liberman V.Sedlacek J.H.C.Uttaro R.S.Bates A.K.Van Peski C. J. Vac. Sci. Technol. B 17 1999 3262.
11. Liberman, V. Rothschild, M. Spector, S.J. Krohn, K.E. Cann, S.G. Hien, S. Proc. SPIE 4691 (2002) 561.
12. Grenville, A. Liberman, V. Rothschild, M. Sedlacek, J.H.C. French, R.H. Wheland, R.C. Zhang, X. Gordon, J. Proc. SPIE 4691 (2002) 644.
13. See web site http://www.sematech.org/public/news/releases/hardpellicles.htm.
14. Kunz R.R.Bloomstein T.M.Hardy D.E.Goodman R.B.Downs D.K.Curtin J.E. J. Vac. Sci. Technol. B 17 1999 3267.
15. Fedynyshyn, T.H. Mowers, W.A. Kunz, R.R. Sinta, R.F. Sworin, M. Goodman, R.B. Proc. SPIE 4690 (2002) 29.
16. Kodama, S. Kaneko, J. Takebe, Y. Okada, S. Kawaguchi, Y. Ishikawa, S. Shida, N. Toriumi, M. Itani, T. Proc. SPIE 4690 (2002) 76.
17. Suganaga, T. Kanda, N. Yamabe, O. Watanabe, K. Itani, T. Cashmore, J.S. Gower, M.C. Proc. SPIE 4691 (2002) 584.
18. Switkes M.Rothschild M. J. Vac. Sci. Technol. B 19 2001 253.