Advanced F2-lasers for 157 nm lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1175-1182

  Vogler, Klaus ^a   Klaft, Ingo ^a   Voss, Frank ^a   Bragin, Igor ^a   Bergmann, Elko ^a   Nagy, Tamas ^a   Niemoeller, Norbert ^a   Paetzel, Rainer ^a   Govorkov, Sergei ^b   Hua, Gongxue ^b  

^a Lambda Physik GmbH   (Germany)

^b Lambda Physik USA Inc   (United States)

Author keywords

157 nm lithography; Absolute calibration; Excimer laser; F2 laser; Power meter; Spectral bandwidth

Indexed keywords

BANDWIDTH; CALIBRATION; EXCIMER LASERS; PRESSURE EFFECTS; SPECTROMETERS;

SPECTRAL BANDWIDTH;

PHOTOLITHOGRAPHY;

EID: 18544376202     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435652     Document Type: Article

References (6)

1. R. Harbinson, International SEMATECH's 157 nm Technical Review Meeting, 14-16 November, 2000, San Diego, CA, USA.
2. U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Pätzel, E. Slobodtchikov, K. Vogler, F. Voß and D. Basting, "Excimer laser for 157nm lithography", SPIE Microlithography 1999, Santa Clara, CA, USA.
3. 2 lasers for microlithography", SPIE Microlithography 2000, Santa Clara, CA, USA.
4. th International Workshop on Laser Beam and Optics Characterization, Erice, Italy, March 20-25, 2000.
5. C. Sansonetti, J. Reader, K. Vogler, " ", in print: Appl. Optics, April 2001.
6. F. Becker, K. Gruetzmacher, K. Vogler will be submitted to: Appl. Optics.