Attenuating phase shifting mask at 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 561-567

  Liberman, Vlad ^a   Rothschild, M ^a   Spector, S J ^a   Krohn, K E ^a   Cann, S C ^a   Hien, S ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

157 nm; Attenuating phase shifter; Platinum; Spin on glass

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE ATTENUATION; LITHOGRAPHY; PHASE SHIFT; PHASE SHIFTERS; PLATINUM;

SPIN-ON GLASS;

MASKS;

EID: 0036410487     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474603     Document Type: Article

References (13)

1. M. Fritze, P.W. Wyatt, D.K. Astolfi, P. Davis, A.V. Curtis, D.M. Preble, S.G. Cann, S. Deneault, D. Chan, J.C. Shaw, N.T. Sullivan, R. Brandom, and M.E. Mastovich, Proc. SPIE 4000, 1179 (2001).
2. R.J. Socha, W.E. Conley, X. Shi, M.V. Dusa, J.S. Petersen, F. Chen, K. Wampler, T. Laidig and R. Caldwell, Proc. SPIE 3748, 290 (1999).
3. Y.-M. Ham, S.-M. Kim, S.-J. Kim, S.-M. Bae, Y.-D. Kim, and K.-H. Baik, Proc. SPIE 4186, 275 (2001).
4. C.-M. Wang, S.-J. Lin, C.-H. Lin, Y.-C. Ku, and A. Yen, Proc. SPIE 4186, 359 (2001).
5. K. Nakazawa, T. Matsuo, T. Onodera, H. Morimoto, H. Mohri, C. Hatsuta, and N. Hayashi, Proc. SPIE 4066, 682 (2000).
6. S. Kanai, S. Kawada, A. Isao, T. Sasaki, K. Maetoko, and N. Yoshioka, Proc. SPIE 4186, 846 (2001).
7. S.J. Chey, C.R. Guarnieri, K. Babich, K.R. Pope, D.L. Goldfarb, M. Angelopoulos, K.C. Racette, M.S. Hibbs, M.L. Gibson, and K.R. Kimmel, Proc. SPIE 4346, 798 (2001).
8. P.F. Carcia, R.H. French, G. Reynolds, G. Hughes, C.C. Torardi, M.H. Reilly, M. Lemon, C.R. Miao, D.J. Jones, L. Wilson, and L. Dieu, Proc. SPIE 3790, 23 (1999).
9. B.W. Smith, A. Bourov, L. Zavyalova, and M. Cangemi, Proc. SPIE 3676, 350 (1999).
10. S. Kim, E. Choi, H. Kim, J. Son, and K. No, Proc. SPIE 4691 (2002).
11. T. Onodera, T. Matsuo, T. Itani, and H. Morimoto, Proc. SPIE 4346, 61 (2001).
12. V. Liberman, M. Rothschild, N.N. Efremow, Jr., S.T. Palmacci, J.H.C. Sedlacek, and A. Grenville, Proc. SPIE 4691 (2002).
13. H.S. Kim, Aug. 2001 (unpublished). The definition of DOF is somewhat different than the ±10% CD control used in this paper. Instead, it relies on normalized image log slope.