Controlled contamination of optics under 157-nm laser irradiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 685-694

  Bloomstein, T M ^a   Liberman, V ^a   Palmacci, S T ^a   Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; CALCIUM COMPOUNDS; CONTAMINATION; IRRADIATION; LASER APPLICATIONS; MONOLAYERS; OPTICAL DEVICES; OXYGEN; SUBSTRATES;

LASER IRRADIATION;

PHOTOLITHOGRAPHY;

EID: 0035759012     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435766     Document Type: Conference Paper

References (4)

1. R. R. Kunz, V. Liberman, and D. K. Downs, "Experimentation and modeling of organic photocontamination on lithographic optics," J. Vac. Sci. Technol. B 18, 1306 (2000).
2. T. M. Bloomstein, M. Rothschild, V. Liberman, D. Hardy, N. N. Efremow Jr., and S. T. Palmacci, "Laser cleaning of optical elements in 157-nm Lithography," Proc. SPIE 4000, 1537 (2000).
3. B. Ranby and J. F. Rabek, "Photodegradation, photo-oxidation and photostabilization of polymers" (John Wiley and Sons, New York, 1975).
4. T. M. Bloomstein, M. Rothschild, V. Liberman, D. Hardy, N. N. Efremow Jr., and S. T. Palmacci, "UV cleaning of contaminated 157-nm reticles," (this volume).