Structural properties of nickel metal-induced laterally crystallized silicon films and their improvement using excimer laser annealing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 5 A, 2003, Pages 2592-2599

  Miyasaka, Mitsutoshi ^a   Shimoda, Tatsuya ^a   Makihira, Kenji ^b   Asano, Tanemasa ^b   Pecz, Béla ^c   Stoemenos, John ^d  

^a SEIKO EPSON CORPORATION   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^c RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^d ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Annealing; Crystallization; Excimer; Grai n; Growth; Laser; Moir ; Nickel; Orientation; Polycrystalline; Silicon

Indexed keywords

ANNEALING; CRYSTAL GROWTH; CRYSTALLIZATION; EXCIMER LASERS; POLYCRYSTALLINE MATERIALS;

LASER ANNEALING;

SEMICONDUCTING FILMS;

EID: 0037697369     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.2592     Document Type: Article

References (23)

1. J. P. Colinge: IEEE Electron Device Lett. 7 (1986) 244.
2. K. Izumi, M. Doken and H. Ariyoshi: Electron. Lett. 14 (1978) 593.
3. T. Yonehara, K. Sakaguchi and N. Sato: Appl. Phys. Lett. 64 (1994) 2108.
4. M. Bruel: Electron. Lett. 31 (1995) 1201.
5. K. Makihira and T. Asano: Dig. Tech. Papers 1999 Int. Workshop on Active-Matrix Liquid-Crystal Displays, 1999, Tokyo, p. 85.
6. K. Makihira and T. Asano: Appl. Phys. Lett. 76 (2000) 3774.
7. K. Makihira and T. Asano: Dig. Tech. Papers 2000 Int. Workshop on Active-Matrix Liquid-Crystal Displays, 2000, Tokyo, p. 33.
8. C. Hayzelden and J. L. Batstone: J. Appl. Phys. 73 (1993) 8279.
9. Z. Jin, G. A. Bhat, M. Yeung, H. S. Kwok and M. Wong: J. Appl. Phys. 84 (1998) 194.
10. L. K. Lam, S. Chen and D. G. Ast: Appl. Phys. Lett. 74 (1999) 1866.
11. J. Jang, S. J. Park, K. H. Kim, B. R. Cho, W. K. Kwak and S. Y. Yoon: J. Appl. Phys. 88 (2000) 3099.
12. Z. Jin, K. Moulding, H. S. Kwok and M. Wong: IEEE Trans. Electron Devices 46 (1999) 78.
13. S. Y. Yoon, S. J. Park, K. H. Kim, J. Jang and C. O. Kim: J. Appl. Phys. 87 (2000) 609.
14. D. Murley, N. Young, M. Trainor and D. McCulloch: Dig. Tech. Papers 2000 Int. Workshop on Active-Matrix Liquid-Crystal Displays, 2000, Tokyo, p. 29.
15. M. Miyasaka and J. Stoemenos: J. Appl. Phys. 86 (1999) 5556.
16. P. B. Hirsch, A. Howie, R. B. Nicholson, D. W. Pashley and M. J. Whelan: Electron Microscopy of Thin Crystals (Butterworths, London, 1965).
17. M. Miyasaka, K. Makihira, T. Asano, E. Polychroniadis and J. Stoemenos: Appl. Phys. Lett. 80 (2002) 944.
18. C. H. Chu, Y. M. Lu and M. H. Hon: J. Mat. Sci. 27 (1992) 3883.
19. R. Drosd and J. Washburn: J. Appl. Phys. 53 (1982) 397.
20. T. Sameshima: Appl. Surf. Sci. 96-98 (1996) 352.
21. T. Sameshima: Mater. Sci. Eng. B 45 (1997) 186.
22. M. Miyasaka, M. Hogyoku, S. Inoue, T. Shimoda and J. Stoemenos: Dig. Tech. Papers 1999 Int. Workshop on Active-Matrix Liquid-Crystal Displays, 1999, Tokyo, p. 257.
23. Y. Hirakata, M. Sakakura, S. Eguchi, Y. Shionoiri, S. Yamazaki, H. Washio, Y. Kubota, N. Makita and M. Hijikigawa: 2000 Society for Information Display Dig., 2000, p. 1014.