Laser processing for thin film transistor applications

Materials Science and Engineering B

Volumn 45, Issue 1-3, 1997, Pages 186-193

  Sameshima, T ^a,b  

^a SONY CORPORATION   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Laser amorphization; Laser crystallization; Plasma hydrogenation; Polycrystalline silicon thin film transistors; Remote plasma CVD; SiO evaporation

Indexed keywords

AMORPHIZATION; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; EVAPORATION; HYDROGENATION; LASER APPLICATIONS; MELTING; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS;

REMOTE PLASMA CHEMICAL VAPOR DEPOSITION;

THIN FILM TRANSISTORS;

EID: 0031097246     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01886-7     Document Type: Article

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