The effects of extended heat treatment on Ni induced lateral crystallization of amorphous silicon thin films

IEEE Transactions on Electron Devices

Volumn 46, Issue 1, 1999, Pages 78-82

  Jin, Zhonghe ^a   Moulding, Keith ^b   Kwok, Hoi S ^a   Wong, Man ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Lateral crystallization; Low temperature; Nickel; Thin film transistors

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; HEAT TREATMENT; LOW TEMPERATURE EFFECTS; NICKEL; OPTICAL MICROSCOPY; THIN FILM TRANSISTORS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

METAL INDUCED LATERAL CRYSTALLIZATION (MILC);

SEMICONDUCTING FILMS;

EID: 0032715710     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.737444     Document Type: Article

References (12)

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