Enhanced nucleation in solid-phase crystallization of amorphous Si by imprint technology

Applied Physics Letters

Volumn 76, Issue 25, 2000, Pages 3774-3776

  Makihira, Kenji ^a   Asano, Tanemasa ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000846710     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126777     Document Type: Article

References (10)

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