X-ray microbeam strain measurements in polycrystalline films

Materials Science Forum

Volumn 426-432, Issue 5, 2003, Pages 3945-3950

  Cargill III, G S ^a   Moyer, L ^a   Yang, Wenge ^b   Larson, B C ^b   Ice, G E ^b  

^a Lehigh University   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Electromigration; Microbeam; Residual strain; X ray

Indexed keywords

CHARGE COUPLED DEVICES; GRAIN SIZE AND SHAPE; STRAIN; THIN FILMS;

RESIDUAL STRAIN;

POLYCRYSTALLINE MATERIALS;

EID: 0037662291     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (11)

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