X-ray microdiffraction for VLSI

Materials Research Society Symposium - Proceedings

Volumn 427, Issue , 1996, Pages 35-46

  Wang, P C ^a   Cargill III, G S ^a   Noyan, I C ^a   Liniger, E G ^a   Hu, C K ^a   Lee, K Y ^a  

^a Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION; STRAIN MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

MICRONSCALE SPATIAL RESOLUTION; X RAY MICROBEAM DIFFRACTION;

VLSI CIRCUITS;

EID: 0030416261     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-427-35     Document Type: Conference Paper

References (23)