X-ray microbeam studies of electromigration

Materials Research Society Symposium - Proceedings

Volumn 563, Issue , 1999, Pages 153-161

  Cargill III, G S ^a   Ho, A C ^a   Hwang, K J ^a   Kao, H K ^a   Wang, P C ^b   Hu, C K ^c  

^a LEHIGH UNIVERSITY   (United States)

^b IBM MICROELECTRONICS   (United States)

^c IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION; POLYCRYSTALLINE MATERIALS; STRAIN MEASUREMENT; STRESSES; X RAY ANALYSIS;

POLYCRYSTALLINE METALS; STRESS GRADIENT; X-RAY MICROBEAM ANALYSIS;

ELECTRIC CONTACTS;

EID: 0033284075     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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