Quantum chemical modeling for 157 nm photolithography

Journal of Fluorine Chemistry

Volumn 122, Issue 1, 2003, Pages 37-46

  Waterland, Robert L ^a   Dobbs, Kerwin D ^a   Rinehart, Amy M ^a   Feiring, Andrew E ^a   Wheland, Robert C ^a   Smart, Bruce E ^a  

^a DUPONT COMPANY   (United States)

Author keywords

157 nm; Fluorohexane; Photoresist; Quantum chemistry; TD DFT; Vacuum ultraviolet; VUV

Indexed keywords

FLUORINE DERIVATIVE; HALOGENATED HYDROCARBON; HEXANE; POLYMER;

ARTICLE; CHEMICAL MODEL; CONTROLLED STUDY; DENSITY; ELECTRONICS INDUSTRY; LIGHT ABSORPTION; MOLECULE; PHOTOCHEMISTRY; PHOTOREACTIVITY; QUANTUM CHEMISTRY; SPECTRAL SENSITIVITY; THEORY; TIME; ULTRAVIOLET RADIATION;

EID: 0038786660     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(03)00078-2     Document Type: Article

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