Time dependence study of the anisotropic etching of silicon by electrochemical impedance spectroscopy and atomic force microscopy

Journal of Electroanalytical Chemistry

Volumn 548, Issue SUPPL., 2003, Pages 49-67

  Serantoni, Marina ^a   Cunnane, Vincent J ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

AFM; EIS; Pre treatments; Silicon etching; Surface states

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; CYCLIC VOLTAMMETRY; ETCHING; POLYMERS; SPECTROSCOPY;

SURFACE STATES;

SILICON;

EID: 0037562898     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(03)00219-5     Document Type: Article

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