Measurements of thermal transport in low stress silicon nitride films

Applied Physics Letters

Volumn 72, Issue 18, 1998, Pages 2250-2252

  Holmes, W ^a,b   Gildemeister, J M ^a,b   Richards, P L ^a,b   Kotsubo, V ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c Conductus Inc ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001151807     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121269     Document Type: Article

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