A triple axis mode X-ray diffraction measurement on elastic strain distribution of lightly Cr-doped SI-GaAs for laser windows

Materials Research Bulletin

Volumn 38, Issue 4, 2003, Pages 675-680

  Li, Jianming ^a   Tu, Hailing ^a   Hu, Guangyong ^a   Wang, Chaoqun ^a   Zheng, Ansheng ^a   Qian, Jiayu ^a  

^a GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS   (China)

Author keywords

Optical materials; X ray diffraction

Indexed keywords

DOPING (ADDITIVES); LATTICE CONSTANTS; RAPID THERMAL ANNEALING; SEMICONDUCTING GALLIUM ARSENIDE; SILICON WAFERS; STRAIN; X RAY DIFFRACTION;

SPATIAL VARIATION;

LASER WINDOWS;

EID: 0037463934     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(02)01065-6     Document Type: Article

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