Photoreactivity of alkylsilane self-assembled monolayers on silicon surfaces and its application to preparing micropatterned ternary monolayers

Langmuir

Volumn 19, Issue 6, 2003, Pages 1966-1969

  Hong, Lan ^a   Sugimura, Hiroyuki ^a   Furukawa, Takeshi ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT EXPOSURE;

ELLIPSOMETRY; HYDROLYSIS; MONOLAYERS; PHOTOREACTIVITY; SCANNING ELECTRON MICROSCOPY; SILICON; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLY;

EID: 0037453652     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0205194     Document Type: Article

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