Imaging micropatterned organosilane self-assembled monolayers on silicon by means of scanning electron microscopy and Kelvin probe force microscopy

Surface and Interface Analysis

Volumn 35, Issue 1, 2003, Pages 94-98

  Wu, Yunying ^a,b   Hayashi, Kazuyuki ^a   Saito, Nagahiro ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b AICHI SCIENCE AND TECHNOLOGY FOUNDATION   (Japan)

Author keywords

Field emission scanning electron microscopy; Kelvin probe force microscopy; Molecular orbital calculation; Organosilane self assembled monolayer; Scanning probe microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; ELECTRONIC DENSITY OF STATES; MICROSTRUCTURE; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION; SILANES; SILICA; SUBSTRATES; SURFACE PROPERTIES; ULTRAVIOLET SPECTROSCOPY;

FIELD-EMISSION SCANNING ELECTRON MICROSCOPY; KELVIN PROBE FORCE MICROSCOPY; MOLECULAR ORBITAL CALCULATION; ORGANOSILANE SELF-ASSEMBLED MONOLAYER; SCANNING PROBE MICROSCOPY; SURFACE POTENTIOMETRY; VACUUM ULTRAVIOLET LIGHT;

MONOLAYERS;

EID: 0037259498     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1501     Document Type: Article

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