An atomic force microscopy study of ozone etching of a polystyrene/polyisoprene block copolymer

Polymer

Volumn 44, Issue 8, 2003, Pages 2403-2410

  Collins, S ^a   Hamley, I W ^a   Mykhaylyk, T ^a  

^a UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

Atomic force microscopy; Ozonation; Triblock copolymers

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; OZONE; SPIN COATING;

OZONE ETCHING;

BLOCK COPOLYMERS;

COPOLYMER; ISOPRENE; OZONE; POLYSTYRENE;

ANALYTIC METHOD; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; FILM; OZONATION; STRUCTURE ANALYSIS;

BLOCK COPOLYMER; ETCHING; FILM; OZONE TREATMENT;

EID: 0037451193     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(03)00113-7     Document Type: Article

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