Effect of growth temperature on ZnO thin film deposited on SiO2 substrate

Materials Science and Engineering: B

Volumn 98, Issue 2, 2003, Pages 135-139

  Kim, Kwang Sik ^a   Kim, Hyoun Woo ^a   Lee, Chong Mu ^a  

^a Inha University   (South Korea)

Author keywords

Low temperature; MOCVD; Thin film; ZnO

Indexed keywords

CRYSTAL STRUCTURE; FILM GROWTH; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; SILICATE MINERALS; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

STRUCTURAL QUALITIES;

ZINC OXIDE;

EID: 0037445192     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00754-7     Document Type: Article

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