Ultrathin Ag films on H:Si(111)-1×1 surfaces deposited at low temperatures

Journal of Applied Physics

Volumn 93, Issue 2, 2003, Pages 924-929

  Muller T ^a   Nienhaus, H ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; EVAPORATION; FILM GROWTH; FILM PREPARATION; LOW TEMPERATURE EFFECTS; MONOLAYERS; PHOTOELECTRON SPECTROSCOPY; WETTING;

FILM THICKNESS;

ULTRATHIN FILMS;

EID: 0037439910     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1530714     Document Type: Article

References (35)

1. H. Nienhaus, Surf. Sci. Rep. 45, 1 (2002).
2. B. Gergen, H. Nienhaus, W. H. Weinberg, and E. W. McFarland, Science 294, 2521 (2001).
3. H. Nienhaus, H. S. Bergh, B. Gergen, A. Majumdar, W. H. Weinberg, and E. W. McFarland, Appl. Phys. Lett. 74, 4046 (1999).
4. H. Nienhaus, H. S. Bergh, B. Gergen, A. Majumdar, W. H. Weinberg, and E. W. McFarland, Phys. Rev. Lett. 82, 446 (1999).
5. K. Sumitomo, T. Kobayashi, F. Shoji, K. Oura, and I. Katayama, Phys. Rev. Lett. 66, 1193 (1991).
6. M. Naitoh, F. Shoji, and K. Oura, Surf. Sci. 242, 152 (1991).
7. Y. Ohba, I. Katayama, Y. Yamamoto, M. Watamori, and K. Oura, Appl. Surf. Sci. 113/114, 448 (1997).
8. R. Naik, C. Kota, B. U. M. Rao, and G. W. Auner, J. Vac. Sci. Technol. A 12, 1832 (1994).
9. X. B. Zhang, A. L. Vasiliev, G. Van Tendeloo, Y. He, L.-M. Yu, and P. A. Thiry, Surf. Sci. 340, 317 (1995).
10. M. Naitoh, A. Watanabe, and S. Nishigaki, Surf. Sci. 357-358, 140 (1996).
11. A. Nishiyama, G. ter Horst, P. M. Zagwijn, G. N. van den Hoven, J. W. M. Frenken, F. Garten, A. R. Schlatmann, and J. Vrijmoeth, Surf. Sci. 350, 229 (1996).
12. T. Wadayama, O. Suzuki, K. Takeuchi, H. Seki, T. Tanabe, Y. Suzuki, and A. Hatta, Appl. Phys. A: Mater. Sci. Process. 69, 77 (1999).
13. K. Fukutani, H. Iwai, Y. Murata, and H. Yamashita, Phys. Rev. B 59, 13 020 (1999).
14. A. Arranz, J. F. Sánchez-Royo, J. Avila, V. Pérez-Dieste, P. Dumas, and M. C. Asensio, Phys. Rev. B 65, 075405 (2002).
15. B. Gergen, H. Nienhaus, W. H. Weinberg, and E. W. McFarland, J. Vac. Sci. Technol. B 18, 2401 (2000).
16. I. Matsuda, H. W. Yeom, T. Tanikawa, K. Tono, T. Nagao, S. Hasegawa, and T. Ohta, Phys. Rev. B 63, 125325 (2001).
17. T. Fujino, T. Okuno, M. Katayama, and K. Oura, Jpn. J. Appl. Phys., Part 2 40, L1173 (2001).
18. K. Oura, V. G. Lifshits, A. A. Saranin, A. V. Zotov, and M. Katayama, Surf. Sci. Rep. 35, 1 (1999).
19. J.-T. Ryu, O. Kubo, H. Tani, T. Harada, M. Katayama, and K. Oura, Surf. Sci. 433-435, 575 (1999).
20. J.-T. Ryu, K. Kui, K. Noda, M. Katayama, and K. Oura, Surf. Sci. 401, L425 (1998).
21. Z. Zhang, Q. Niu, and C.-K. Shih, Phys. Rev. Lett. 80, 5381 (1998).
22. A. R. Smith, K.-J. Chao, Q. Niu, and C.-K. Shih, Science 273, 226 (1996).
23. K.-J. Chao, Z. Zhang, Ph. Ebert, and C. K. Shih, Phys. Rev. B 60, 4988 (1999).
24. L. Huang, S. J. Chey, and J. H. Weaver, Surf. Sci. 416, L1101 (1998).
25. M. Horn-von Hoegen, T. Schmidt, M. Henzler, G. Meyer, D. Winau, and K. H. Rieder, Surf. Sci. 331-333, 575 (1995).
26. S. Fölsch, G. Meyer, D. Winau, K. H. Rieder, M. Horn-von Hoegen, T. Schmidt, and M. Henzler, Phys. Rev. B 52, 13 745 1995).
27. D. A. Evans, M. Alonso, R. Cimino, and K. Horn, Phys. Rev. Lett. 70, 3483 (1993).
28. G. Neuhold and K. Horn, Phys. Rev. Lett. 78, 1327 (1997).
29. H. Nienhaus, H. S. Bergh, B. Gergen, A. Majumdar, W. H. Weinberg, and E. W. McFarland, J. Vac. Sci. Technol. A 17, 1683 (1999).
30. G. A. Somorjai, Chemistry in Two Dimensions (Cornell University Press, Ithaca, NY, 1981).
31. W. Mönch, Semiconductor Surfaces and Interfaces, 3rd ed. (Springer, Berlin, 2001).
32. Y. He, S. Bouzidi, B.-Y. Han, L.-M. Yu, P. A. Thiry, R. Caudano, and J.-M. Debever, Phys. Rev. B 54, 17 654 (1996).
33. F. Wehking, H. Beckermann, and R. Neddermayer, Thin Solid Films 36, 265 (1976).
34. H. F. Roloff and H. Neddermeyer, Solid State Commun. 21, 561 (1977).
35. Handbook of Chemistry and Physics, 76th ed., edited by D. R. Lide (CRC Press, Boca Raton, FL, 1996).