Morphological investigation of ultrathin Ag and Ti films grown on hydrogen terminated Si(111)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2401-2405

  Gergen, B ^a   Nienhaus, H ^b   Weinberg, W H ^a   McFarland, E M ^a  

^a University of California   (United States)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC RESISTANCE MEASUREMENT; ELECTRODEPOSITION; HYDROGEN; MORPHOLOGY; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SILVER; SUBSTRATES; TITANIUM; ULTRATHIN FILMS; VACUUM APPLICATIONS;

ELECTRON BEAM DEPOSITION; STRANSKI-KRASTANOV MODE; ULTRAHIGH VACUUM (UHV) SYSTEMS;

SEMICONDUCTING FILMS;

EID: 0034268772     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1308597     Document Type: Article

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