Characterization of (Ba,Sr)TiO3 thin-film capacitors with Ir bottom electrodes and its improvement by plasma treatment

Microelectronic Engineering

Volumn 66, Issue 1-4, 2003, Pages 600-607

  Wuu, Dong Sing ^a   Horng, Ray Hua ^a   Lin, Chin Ching ^a   Liu, Yan Hong ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b DA YEH UNIVERSITY   (Taiwan)

Author keywords

(Ba; Capacitor; High dielectric constant; Ir; Leakage current; Plasma materials processing applications; Sr)TiO3

Indexed keywords

CAPACITORS; ELECTRODES; LEAKAGE CURRENTS; PERMITTIVITY; PLASMAS; SURFACE TREATMENT;

PLASMA TREATMENT;

THIN FILM DEVICES;

EID: 0037391720     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00971-1     Document Type: Conference Paper

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