Electrical and Physical Properties of Ultrathin Reoxidized Nitrided Oxides Prepared by Rapid Thermal Processing

IEEE Transactions on Electron Devices

Volumn 36, Issue 2, 1989, Pages 340-350

  Hori, Takashi ^a   Iwasaki, Hiroshi ^a   Tsuji, Kazuhiko ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT--NITRIDING; OXIDES--THIN FILMS; SEMICONDUCTOR DEVICES, MOS; SPECTROSCOPY, AUGER ELECTRON;

REOXIDIZED NITRIDED OXIDES; SIMS STUDIES;

FILMS;

EID: 0024610593     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.19935     Document Type: Article

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