A simplified collisional model of sputtering in the linear cascade regime

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 1976-1989

  Mahan, John E ^a   Vantomme, André ^b,c  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

^b KU LEUVEN   (Belgium)

^c FUND FOR SCIENTIFIC RESEARCH   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031524280     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580668     Document Type: Article

References (31)

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16. Displacement, on the other hand, is the removal from its lattice site of a target atom which then remains within the target, i.e., the creation of a vacancy plus an interstitial atom. As a consequence, the displacement energy [∼15-30 eV (Ref. 12)] is much larger than the surface binding energy (∼4-5 eV - see Table I in Sec. VI). The displacement energy is not relevant to our calculation of sputter yield and our recoils need not be displaced atoms, as such. Why? In an actual displacement, the interstitial atom must be removed to a sufficient distance that recombination with the vacancy does not occur. This recombination zone can extend over many crystalline unit cells, and its radius is typically greater than the depth from which most sputtered atoms originate. Thus, recoils need not have the energy of displaced atoms in order to be sputtered (Ref. 8).
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