Nanodevices produced with focussed ion beams

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 139, Issue 1-4, 1998, Pages 12-19

  Dotsch U ^a   Wieck, A D ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC INSULATING MATERIALS; FIELD EFFECT TRANSISTORS; ION BEAMS; NANOSTRUCTURED MATERIALS; SEMICONDUCTING GALLIUM; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES;

FOCUSED ION BEAMS (FIB);

NUCLEAR INSTRUMENTATION;

EID: 0032043198     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00955-5     Document Type: Article

References (30)

1. J. Melngailis, J. Vac. Sci. Technol. B 5 (1987) 469.
2. J. Orloff, Rev. Sci. Instrum. 64 (1993) 1105.
3. X. Xu, A.D. Della Ratta, J. Sosokina, J. Melngailis, J. Vac. Sci. Technol. B 10 (1992) 2675.
4. T.J. Stark, G.M. Shedd, J. Vitarelli, D.P. Griffis, P.E. Russell, J. Vac. Sci. Technol. B 13 (1995) 2565.
5. R.J. Young, J.R.A. Cleaver, H. Ahmed, J. Vac. Sci. Technol. B 11 (1993) 235.
6. L.R. Harriott, J. Vac. Sci. Technol. B 11 (1993) 2200.
7. K. Gamo, S. Namba, J. Vac. Sci. Technol. B 8 (1990) 1927.
8. H.-C. Petzold, P.J. Heard, J. Vac. Sci. Technol. B 9 (1991) 2664.
9. L. Bischoff, E. Hesse, D. Panknin, W. Skorupa, J. Teichert, Microelectronic Engineering 23 (1994) 115.
10. I. Ohdomari, Single Ion Implantation System, US-Patent Nr. 5,539,203 (1996).
11. D.K. de Vries, A.D. Wieck, K. Ploog, J. Vac. Sci. Technol. B 12 (1994) 14.
12. R.D. Tscheuschner, A.D. Wieck, Superlattices and Microstructures 20 (1996) 615.
13. Y. Hirayama, H. Okamoto, Jpn. J. Appl. Phys. 24 (1985) L985.
14. C. Crell, C. Wieczorek, H.-U. Schreiber, A.D. Wieck, Appl. Phys. Lett. 68 (1996) 2538.
15. A.D. Wieck, K. Ploog, Appl. Phys. Lett. 61 (1992) 1048.
16. A.D. Wieck, K. Ploog, Appl. Phys. Lett. 56 (1990) 928.
17. D. Többen, D.K. de Vries, A.D. Wieck, M. Holzmann, G. Abstreiter, F. Schäffler, Appl. Phys. Lett. 67 (1995) 1579.
18. C. Crell, S. Friedrich, H.-U. Schreiber, A.D. Wieck, J. Appl. Phys., in print.
19. J. Nieder, A.D. Wieck, P. Grambow, H. Lage, D. Heitmann, K.v. Klitzing, K. Ploog, Appl. Phys. Lett. 57 (1990) 2695.
20. P. Baumgartner, K. Brunner, G. Abstreiter, G. Böhm, G. Tränkle, G. Weimann, Appl. Phys. Lett. 64 (1994) 592.
21. D.K. de Vries, P. Stelmaszyk, A.D. Wieck, J. Appl. Phys. 79 (1996) 8087.
22. D.K. de Vries, A.D. Wieck, J. Vac. Sci. Technol. B 13 (1995) 394.
23. D.B. Chklovskii, B.I. Shklovskii, L.I. Glazman, Phys. Rev. B 46 (1992) 4026.
24. M.A. Armstrong, S. Etchin, J. Melngailis, D.A. Antoniadis, J. Appl. Phys. 78 (1995) 560.
25. R. Dingle, H.L. Störmer, A.C. Gossard, W. Wiegmann, Appl. Phys. Lett. 33 (1978) 665.
26. H. van Houten, B.J. van Wees, J.E. Mooij, C.W.J. Beenakker, J.G. Williamson, C.T. Foxon, Europhys. Lett. 5 (1988) 721.
27. K. Nakamura, D.C. Tsui, F. Nihey, H. Toyoshima, T. Itoh, Appl. Phys. Lett. 56 (1989) 385.
28. J. Spector, H.L. Störmer, K.W. Baldwin, L.N. Pfeiffer, K. West, Appl. Phys. Lett. 56 (1990) 967.
29. R.J. Haug, A.D. Wieck, K. von Klitzing, K. Ploog, Physica B 184 (1993) 192.
30. T. Bever, K.v. Klitzing, A.D. Wieck, K. Ploog, Appl. Phys. Lett. 63 (1993) 642.