Pattern collapse for nanoline formation

Journal of the Korean Physical Society

Volumn 42, Issue SPEC., 2003, Pages

  Kim, Sang Kon ^a  

^a Hanyang University   (South Korea)

Author keywords

Chemically amplified resist; Finite difference time domain method; Lithography; Monte Carlo method; Neural network; Pattern collapse; Response surface model

Indexed keywords

EID: 0037307695     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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