Sensitivity of simulation parameter for critical dimension

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4222-4227

  Kim, Sang Kon ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Critical dimension; Lithography; Optimization; Response surface methodology; Simulation parameters

Indexed keywords

COMPUTER SIMULATION; FOURIER TRANSFORMS; OPTIMIZATION; SENSITIVITY ANALYSIS;

CRITICAL DIMENSIONS (CD); RESPONSE SURFACE METHODOLOGY (RSM);

PHOTORESISTS;

EID: 0036614418     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4222     Document Type: Article

References (14)