Application of artificial neural networks (ANN) and response surface model (RSM) in optical microlithographic process modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 820-830

  Zhou, Bo ^a   McPherron, Barry A ^b  

^a Sun StorageTek   (United States)

^b MOTOROLA INC   (United States)

Author keywords

Artificial neural network; Critical dimension; Design of experiment; Response surface model

Indexed keywords

BACKPROPAGATION; DESIGN OF EXPERIMENTS; EXPERIMENTS; MICROELECTRONICS; PROCESS CONTROL; SURFACE PROPERTIES;

ARTIFICIAL NEURAL NETWORK; ARTIFICIAL NEURAL NETWORK (ANN) MODELS; CRITICAL DIMENSION; DESIGN OF EXPERIMENT; DESIGN OF EXPERIMENTS (DOE ); OPTICAL MICRO LITHOGRAPHY; PROCESS MODELLING; PROCESS OPTIMIZATION; PROCESS VARIABLES; RESPONSE SURFACE MODEL; SOFT BAKE; YIELD IMPROVEMENTS;

NEURAL NETWORKS;

EID: 0003927440     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310816     Document Type: Conference Paper

References (21)

1. T. A. Carroll and W. F. Ramirez, "Development of Positive Optical Photoresists: Adaptive Control," Chemical Engineering Science, 48(12), pp.2239-2250, 1993.
2. T. A. Carroll, On-Line Identification and Optimal Control of the Positive Optical Microlithographic Spray Development Process Using Interferometry, Ph.D. Thesis, University of Colorado at Boulder, Boulder, Colorado, pp.1-9, 1990.
3. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of Positive Photoresist," IEEE Trans. Elect. Dev., ED-22(7), pp.445-452, 1975.
4. F. H. Dill, "Optical Lithography," IEEE Trans. Elect. Dev., ED-22(7), pp.440-444, 1975.
5. C. A. Mack, "Development of Positive Photoresist," J. Electrochem. Soc., 134(1), pp.148-152, 1987.
6. R. E. Jewett, A. R. Neureuther, and T. Van Duzer, "Line-Profile Resist Development Simulation Techniques," Polymer Eng. Sci., 17(6), pp.381-384, 1977.
7. W. G. Oldham, S. N. Nandgaonkar, A. R. Neureuther and M. O'Toole, "A General Simulator for VLSI Lithography and Etching Processes: Part I - Application to Projection Lithography," IEEE Trans. Elect. Dev., ED-26(4), pp.717-722, 1979.
8. E. A. Rietman and E. R. Lory, "Use of Neural Network in Modeling Semiconductor Manufacturing Processes: an Example for Plasma Etch Modeling," IEEE Trans. Semi. Manu., 6(4), pp.343-347, 1993.
9. G. E. P. Box and N. R. Draper, Empirical Modeling-Building and Response Surfaces, John Wiley & Sons, New York, 1986.
10. M. Johnson and K. Lee, "Optimization of a Photoresist Process Using Statistical Design of Experiment," Solid State Technology, Sep., pp.281-284, 1984.
11. M. P. C. Watts, M. R. Hannifan, and T. Perera, "A New Response Surface Analysis Procedure for Evaluating Process Control in Photolithography," Proc. SPIE, vol. 631, pp.260-266, 1986.
12. P. Schoenborn and N. F. Pasch, "Process Sensitivity Analysis: Application to Photolithography", Proc. SPIE, vol.1087, pp.290-298, 1989.
13. C. D. Himmel and G. S. May, "Advantages of Plasma Etch Modeling Using Neural Networks Over Statistical Techniques," IEEE Trans. Semi. Manuf., 6(2), pp.103-111, 1993.
14. X. A. Wang and R. L. Mahajan, "Artificial Neural Network Model-Based Run-to-Run Process Controller," IEEE Trans. Comp., Pack, and Manuf. Tech., part C, 19(1), pp.19-26, 1996.
15. B. Kim and G. S. May, "Reactive Ion Etch Modeling Using Neural Networks and Simulated Annealing," IEEE Trans. Comp., Pack., and Manuf. Tech., part C, 19(1), pp.3-8, 1996.
16. S. Haykin, Neural Networks, Macmillan College Publishing Company, New York, 1994.
17. G. Cardarelli, M. Palumbo, and P. M. Pelagagge, "Photolithography Process Modeling Using Neural Networks," Semiconductor International, pp.199-206, Jun. 1996,
18. B. McPherron, "Design of Experiments of Photolithographic Process," in preparation.
19. D. C. Montgomery, Introduction to Statistical Quality Control, John Wiley & Sons, New York, 1990.
20. H. Demuth and M. Beale, Neural Network Toolbox User's Guide, The Math Works, Inc., Natick, Mass., 1994.
21. M. Smith, Neural Networks for Statistical Modeling, Van Nostrand Reihold, New York, 1993.