Modification of the development parameter for a chemically amplified resist simulator

Journal of the Korean Physical Society

Volumn 40, Issue 4, 2002, Pages 725-728

  Seo, Eun Jung ^a   Bak, Heung Jin ^a   Kim, Sang Kon ^a   Sohn, Young Soo ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Chemically amplified resist; Development parameter; Lithography

Indexed keywords

EID: 0036011366     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.40.725     Document Type: Conference Paper

References (10)

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