Prevention of photoresist pattern collapse by using liquid carbon dioxide

Industrial and Engineering Chemistry Research

Volumn 40, Issue 24, 2001, Pages 5858-5860

  Jincao, Y ^a   Matthews, M A ^a   Darvin, C H ^b  

^a University of South Carolina   (United States)

^b U S ENVIRONMENTAL PROTECTION AGENCY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CARBON DIOXIDE; POLYMERS; SOLUTIONS; SOLVENTS; SURFACE TENSION;

PHOTORESIST POLYMERS;

PHOTORESISTS;

CARBON DIOXIDE; POLYMER;

AQUEOUS SOLUTION; CARBON DIOXIDE; CLEANING; POLYMER;

AQUEOUS SOLUTION; ARTICLE; CHEMICAL ENGINEERING; FORCE; MATHEMATICAL MODEL; PRESSURE; SURFACE TENSION;

EID: 0035965660     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie010424h     Document Type: Article

References (7)

1. Mechanism of resist pattern collapse during development process
2. Prevention of resist pattern collapse by flood exposure during rinse process
3. Prevention of resist pattern collapse by resist heating during rinsing
4. Mechanism of resist pattern collapse
5. Freeze-drying process to avoid resist pattern collapse
6. Imaging polymers with supercritical carbon dioxide
7. Patterning characteristics of a chemically amplified negative resist in synchrotron radiation lithography