Patterning SiO2 thin films using synchrotron radiation stimulated etching with a Co contact mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 2, 2003, Pages 818-822

  Wang, Changshun ^a   Moré, Sam Dylan ^a   Wang, Zhihong ^b   Yamamura, Shusaku ^b   Nonogaki, Yoichi ^b   Urisu, Tsuneo ^b  

^a INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^b GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ETCHING; MASKS; SELF ASSEMBLY; SYNCHROTRON RADIATION; THIN FILMS;

CONTACT MASKS;

SILICA;

EID: 0037274014     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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