Ultrahigh-vacuum reaction apparatus to study synchrotron-radiation-stimulated processes

Journal of Synchrotron Radiation

Volumn 5, Issue 6, 1998, Pages 1363-1368

  Hirano, S ^a   Yoshigoe, A ^a,b   Nagasono, M ^c   Mase, K ^c   Ohara, J ^d   Nonogaki, Y ^c   Takeda, Y ^e   Urisu, T ^c  

^a GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^d DENSO CORPORATION   (Japan)

^e NAGOYA UNIVERSITY   (Japan)

Author keywords

Chemical vapour deposition; Etching; Ir reflection absorption spectroscopy; Molecular beam epitaxy; Synchrotron radiation stimulated processes

Indexed keywords

EID: 0032221806     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049598011534     Document Type: Article

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